ID 111001
Author
Okuda, Koji Tokushima University
Kamada, Shun Tokushima University
Content Type
Journal Article
Description
Plasmonic waveguides have attracted considerable attention for application in highly integrated optical circuits since they can confine light to areas smaller than the diffraction limit. In this context, in order to realize a highly integrated optical circuit, we fabricate and evaluate the optical characteristics of a poly(methyl methacrylate) junction positioned between Si and plasmonic waveguides. For the plasmonic waveguide, we employ a gap plasmonic waveguide in which the energy of the plasmonic wave can be confined in order to reduce the scattering loss at the junction. By experimental measurement, we determine the coupling efficiency between the Si and gap plasmonic waveguides and the propagation length at the gap plasmonic waveguide to be 52.4% and 11.1 µm, respectively. These values agree with those obtained by the three-dimensional finite-difference time-domain simulation. We believe that our findings can significantly contribute to the development of highly integrated optical circuits.
Journal Title
Japanese Journal of Applied Physics
ISSN
13474065
00214922
NCID
AA12295836
AA11509854
Publisher
The Japan Society of Applied Physics
Volume
55
Issue
8S3
Start Page
08RG02
Published Date
2016-07-11
Rights
© 2016 The Japan Society of Applied Physics
EDB ID
DOI (Published Version)
URL ( Publisher's Version )
FullText File
language
eng
TextVersion
Author
departments
Science and Technology