ID | 114444 |
Author |
Girase, Krunal
Tokushima University
Wang, Zhenzhen
Xi’an Jiaotong University|Tokushima University
Kamimoto, Takahiro
Tokushima University
Deguchi, Yoshihiro
Tokushima University|Xi’an Jiaotong University
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Jeon, Mingyu
Korea Maritime and Ocean University
Cui, Minchao
Northwestern Polytechnical University
Chou, Chen-Chia
National Taiwan University of Science and Technology
Huang, Eddy
National Taiwan University of Science and Technology
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Keywords | Plasma Electrolytic Oxidation (PEO)
AZ91D Mg-alloy
Arc regime
Soft regime
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Content Type |
Journal Article
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Description | The effect of bipolar pulse mode current ratio on plasma behavior was investigated in PEO on AZ91D Mg-Alloy. Two cases of current ratio including 1.20 and 0.88 were applied to the sample. Plasma emission behavior was studied using plasma images and plasma emission measured by photodetector and Intensified Charged-Couple Device (ICCD) camera. The current ratio of greater than 1 shows the continuous increase and then stabilization in emission intensity with a gradual increase in voltage throughout the PEO process. In contrast, the current ratio of less than 1, a sudden drop in plasma emission intensity with voltage was found after 786s. Therefore, PEO process can be divided into two regimes, arc regime and soft regime, before and after voltage drop respectively. Results of measured spectra show that a soft regime does not have atomic or ionic excitation during PEO process. It is demonstrated that the growth of porous layer during PEO can be controlled, which is benefit for the protective oxide coating of sample.
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Journal Title |
Modern Physics Letters B
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ISSN | 17936640
02179849
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NCID | AA10672190
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Publisher | World Scientific Publishing
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Volume | 34
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Issue | 07n09
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Start Page | 2040025
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Published Date | 2020-03-11
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Rights | Electronic version of an article published as Modern Physics Letters B, Vol. 34, No. 07n09, 2020, 2040025, 10.1142/S0217984920400254 © World Scientific Publishing Company https://www.worldscientific.com/worldscinet/mplb
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EDB ID | |
DOI (Published Version) | |
URL ( Publisher's Version ) | |
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language |
eng
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TextVersion |
Author
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departments |
Science and Technology
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