Emoto, Akira Doshisha University|Tokushima University Tokushima University Educator and Researcher Directory KAKEN Search Researchers
Honda, Junya Doshisha University
Suzuki, Kou Doshisha University
Kimoto, Takumi Doshisha University
Fukuda, Takashi National Institute of Advanced Industrial Science and Technology
random phase mask
Random phase masks are important technical elements for realizing holographic memory systems that enable high density recording. However, the broadly distributed Fourier spectrum often presents a problem because wide recording spots result in reduced total storage capacity for a recording medium. In the present study, we propose modified random phase masks with phase modulation elements exhibiting Gaussian profiles to suppress the spread of the recording spot and keep it in a narrow area, based on the reduction of the high-frequency components in a random phase pattern. We confirm the effectiveness of the proposed random phase mask using simulations of a computer-generated binary hologram. However, issues still remain in terms of the fabrication of random phase masks with Gaussian profiles. Therefore, we evaluate the feasibility of fabricating the proposed random phase mask using molecular diffusion under photopolymerization. The results confirm the feasibility of this approach over a relatively wide area for actual fabrication.
This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).
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photonics_6_2_62.pdf 4.55 MB
Institute of Post-LED Photonics