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ID 113719
Author
Moriiwa, Kouhei Tokushima University
Keywords
Magnetic field sensor
ferromagnetic subwavelength grating
surface plasmon polariton
Content Type
Journal Article
Description
A sensitive optical magnetic field sensor was experimentally demonstrated using Ni-subwavelength grating (SWG) combined with a SiO2/Ag plasmonic structure. We fabricated the Ni-SWG structure on the Ag/SiO2 structure using electron beam lithography and a liftoff process. As a result, a dip in the reflection spectra with normal incidence was obtained at a wavelength of 530 nm. The reflectivity at the dip position significantly decreased with the intensity of the magnetic field applied to the structure. When a magnetic field of 43 mT was applied, the change in reflection reached approximately 4% of that without magnetic field. The experimental results indicate that our sensor achieves millitesla order of sensitivity for the magnetic field. The electromagnetic field distribution around the Ni-SWG/SiO2/Ag calculated using the finite-difference time-domain method clarified the reason for the high sensitivity of our sensor.
Journal Title
Proceedings of SPIE
ISSN
0277786X
NCID
AA10619755
Publisher
SPIE
Volume
11089
Start Page
110891V
Published Date
2019-09-03
Remark
Yuusuke Takashima, Kouhei Moriiwa, Masanobu Haraguchi, Yoshiki Naoi, "Ni subwavelength grating/SiO2/Ag based optical magnetic field sensor with normal incident geometry," Proc. SPIE 11089, Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XVI, 110891V (3 September 2019); doi: https://doi.org/10.1117/12.2529017
Rights
©2019 Society of Photo-Optical Instrumentation Engineers (SPIE). One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this publication for a fee or for commercial purposes, and modification of the contents of the publication are prohibited.
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DOI (Published Version)
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language
eng
TextVersion
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departments
Science and Technology