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ID 113719
著者
Moriiwa, Kouhei Tokushima University
キーワード
Magnetic field sensor
ferromagnetic subwavelength grating
surface plasmon polariton
資料タイプ
学術雑誌論文
抄録
A sensitive optical magnetic field sensor was experimentally demonstrated using Ni-subwavelength grating (SWG) combined with a SiO2/Ag plasmonic structure. We fabricated the Ni-SWG structure on the Ag/SiO2 structure using electron beam lithography and a liftoff process. As a result, a dip in the reflection spectra with normal incidence was obtained at a wavelength of 530 nm. The reflectivity at the dip position significantly decreased with the intensity of the magnetic field applied to the structure. When a magnetic field of 43 mT was applied, the change in reflection reached approximately 4% of that without magnetic field. The experimental results indicate that our sensor achieves millitesla order of sensitivity for the magnetic field. The electromagnetic field distribution around the Ni-SWG/SiO2/Ag calculated using the finite-difference time-domain method clarified the reason for the high sensitivity of our sensor.
掲載誌名
Proceedings of SPIE
ISSN
0277786X
cat書誌ID
AA10619755
出版者
SPIE
11089
開始ページ
110891V
発行日
2019-09-03
備考
Yuusuke Takashima, Kouhei Moriiwa, Masanobu Haraguchi, Yoshiki Naoi, "Ni subwavelength grating/SiO2/Ag based optical magnetic field sensor with normal incident geometry," Proc. SPIE 11089, Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XVI, 110891V (3 September 2019); doi: https://doi.org/10.1117/12.2529017
権利情報
©2019 Society of Photo-Optical Instrumentation Engineers (SPIE). One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this publication for a fee or for commercial purposes, and modification of the contents of the publication are prohibited.
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言語
eng
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出版社版
部局
理工学系