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ID 116127
Author
Content Type
Journal Article
Description
Color filters based on all-dielectric subwavelength structures (SWSs) allow precise control of the coloration during production. However, SWS manufacturing typically requires complex processes, such as lift-off or etching. Here, highly reflective color filters manufactured without lift-off and etching techniques were experimentally demonstrated using a double-layer high-contrast all-dielectric SWS. The SWSs were fabricated on optical glass substrates using electron beam lithography and evaporation. Visible reflection spectra were controlled by adjusting structural parameters. Red, green, and blue colorations were experimentally demonstrated with 57%, 63%, and 72% reflectivities, respectively. High reflectivity, manufacturing throughput and level of control of the manufactured filter color make them suitable for imaging, display, and sensing applications.
Journal Title
Optical Materials Express
ISSN
21593930
Publisher
OSA publishing
Volume
11
Issue
8
Start Page
2712
End Page
2721
Published Date
2021-07-27
Rights
© 2021 Optical Society of America. Users may use, reuse, and build upon the article, or use the article for text or data mining, so long as such uses are for non-commercial purposes and appropriate attribution is maintained. All other rights are reserved.
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DOI (Published Version)
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FullText File
language
eng
TextVersion
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departments
Science and Technology