Color filters based on all-dielectric subwavelength structures (SWSs) allow precise control of the coloration during production. However, SWS manufacturing typically requires complex processes, such as lift-off or etching. Here, highly reflective color filters manufactured without lift-off and etching techniques were experimentally demonstrated using a double-layer high-contrast all-dielectric SWS. The SWSs were fabricated on optical glass substrates using electron beam lithography and evaporation. Visible reflection spectra were controlled by adjusting structural parameters. Red, green, and blue colorations were experimentally demonstrated with 57%, 63%, and 72% reflectivities, respectively. High reflectivity, manufacturing throughput and level of control of the manufactured filter color make them suitable for imaging, display, and sensing applications.
Optical Materials Express
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