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ID 116127
著者
資料タイプ
学術雑誌論文
抄録
Color filters based on all-dielectric subwavelength structures (SWSs) allow precise control of the coloration during production. However, SWS manufacturing typically requires complex processes, such as lift-off or etching. Here, highly reflective color filters manufactured without lift-off and etching techniques were experimentally demonstrated using a double-layer high-contrast all-dielectric SWS. The SWSs were fabricated on optical glass substrates using electron beam lithography and evaporation. Visible reflection spectra were controlled by adjusting structural parameters. Red, green, and blue colorations were experimentally demonstrated with 57%, 63%, and 72% reflectivities, respectively. High reflectivity, manufacturing throughput and level of control of the manufactured filter color make them suitable for imaging, display, and sensing applications.
掲載誌名
Optical Materials Express
ISSN
21593930
出版者
OSA publishing
11
8
開始ページ
2712
終了ページ
2721
発行日
2021-07-27
権利情報
© 2021 Optical Society of America. Users may use, reuse, and build upon the article, or use the article for text or data mining, so long as such uses are for non-commercial purposes and appropriate attribution is maintained. All other rights are reserved.
EDB ID
出版社版DOI
出版社版URL
フルテキストファイル
言語
eng
著者版フラグ
出版社版
部局
理工学系