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ID 114980
著者
Tanaka, Atsushi Nagoya University|National Institute for Materials Science
Usami, Shigeyoshi Nagoya University
Kushimoto, Maki Nagoya University
Deki, Manato Nagoya University
Nitta, Shugo Nagoya University
Honda, Yoshio Nagoya University
Bockowski, Michal Polish Academy of Sciences
Amano, Hiroshi Nagoya University|National Institute for Materials Science
資料タイプ
学術雑誌論文
抄録
In this study, V-shaped dislocations in a GaN epitaxial layer on a free-standing GaN substrate were observed. Our investigation further revealed that the V-shaped dislocations were newly generated at the interface in the epilayer rather than propagated from the GaN substrate. V-shaped dislocations consist of two straight parts. The straight parts of the V-shaped dislocations were separated from each other in the m-direction and tilted toward the step-flow direction of the GaN epitaxial layer. The V-shaped dislocations are continuous single dislocations having a Burgers vector component of 1a and an intrinsic stacking fault between their straight parts.
掲載誌名
AIP Advances
ISSN
21583226
出版者
AIP Publishing
9
9
開始ページ
095002
発行日
2019-09-05
権利情報
© 2019 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).
EDB ID
出版社版DOI
出版社版URL
フルテキストファイル
言語
eng
著者版フラグ
出版社版
部局
ポストLEDフォトニクス研究所