Measurement of the residual stress in CrN coatings deposited on an Al alloy substrate
日下, 一也 Tokushima University 徳島大学 教育研究者総覧 KAKEN研究者をさがす
Shirasaka, Kenta Tokushima University
米倉, 大介 Tokushima University 徳島大学 教育研究者総覧 KAKEN研究者をさがす
Tanaka, Yuta IHI Corporation
Chromium nitride (CrN) coatings were deposited on Al alloy substrates using the arc ion plating method with different bias voltages and different thicknesses. The residual stresses of these samples were measured via x-ray diffraction using the sin2 ψ method because the CrN crystals in the coatings were nonoriented. The stress gradient across the CrN coating was calculated from the curved 2θ-sin2 ψ diagram. In the case of CrN coatings deposited at low bias voltage, the compressive residual stress that formed at the substrate interface was larger than the stress at the surface of the CrN coating. Conversely, in the case of CrN coatings deposited at high bias voltage, the compressive residual stress on the surface of the CrN coating was larger than the stress on the interface with the substrate. In CrN coatings deposited at high bias voltage, very large compressive residual stress on the CrN coating surface decreased with increasing coating thickness.
Journal of Vacuum Science & Technology B
American Vacuum Society
This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in Journal of Vacuum Science & Technology B 37, 062916 (2019) and may be found at https://doi.org/10.1116/1.5118702.
This paper is part of the Conference Collection: 15th International Symposium on Sputtering and Plasma Processes (ISSP2019).
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