ID | 111001 |
著者 |
Okuda, Koji
Tokushima University
Kamada, Shun
Tokushima University
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資料タイプ |
学術雑誌論文
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抄録 | Plasmonic waveguides have attracted considerable attention for application in highly integrated optical circuits since they can confine light to areas smaller than the diffraction limit. In this context, in order to realize a highly integrated optical circuit, we fabricate and evaluate the optical characteristics of a poly(methyl methacrylate) junction positioned between Si and plasmonic waveguides. For the plasmonic waveguide, we employ a gap plasmonic waveguide in which the energy of the plasmonic wave can be confined in order to reduce the scattering loss at the junction. By experimental measurement, we determine the coupling efficiency between the Si and gap plasmonic waveguides and the propagation length at the gap plasmonic waveguide to be 52.4% and 11.1 µm, respectively. These values agree with those obtained by the three-dimensional finite-difference time-domain simulation. We believe that our findings can significantly contribute to the development of highly integrated optical circuits.
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掲載誌名 |
Japanese Journal of Applied Physics
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ISSN | 13474065
00214922
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cat書誌ID | AA12295836
AA11509854
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出版者 | The Japan Society of Applied Physics
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巻 | 55
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号 | 8S3
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開始ページ | 08RG02
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発行日 | 2016-07-11
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権利情報 | © 2016 The Japan Society of Applied Physics
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EDB ID | |
出版社版DOI | |
出版社版URL | |
フルテキストファイル | |
言語 |
eng
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著者版フラグ |
著者版
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部局 |
理工学系
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