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ID 111001
著者
Okuda, Koji Tokushima University
Kamada, Shun Tokushima University
資料タイプ
学術雑誌論文
抄録
Plasmonic waveguides have attracted considerable attention for application in highly integrated optical circuits since they can confine light to areas smaller than the diffraction limit. In this context, in order to realize a highly integrated optical circuit, we fabricate and evaluate the optical characteristics of a poly(methyl methacrylate) junction positioned between Si and plasmonic waveguides. For the plasmonic waveguide, we employ a gap plasmonic waveguide in which the energy of the plasmonic wave can be confined in order to reduce the scattering loss at the junction. By experimental measurement, we determine the coupling efficiency between the Si and gap plasmonic waveguides and the propagation length at the gap plasmonic waveguide to be 52.4% and 11.1 µm, respectively. These values agree with those obtained by the three-dimensional finite-difference time-domain simulation. We believe that our findings can significantly contribute to the development of highly integrated optical circuits.
掲載誌名
Japanese Journal of Applied Physics
ISSN
13474065
00214922
cat書誌ID
AA12295836
AA11509854
出版者
The Japan Society of Applied Physics
55
8S3
開始ページ
08RG02
発行日
2016-07-11
権利情報
© 2016 The Japan Society of Applied Physics
EDB ID
出版社版DOI
出版社版URL
フルテキストファイル
言語
eng
著者版フラグ
著者版
部局
理工学系