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ID 114030
著者
Shirasaka, Kenta Tokushima University
Tanaka, Yuta IHI Corporation
資料タイプ
学術雑誌論文
抄録
In this work, the authors propose and verify a method of measuring the residual stress of {112}-oriented chromium nitride (CrN) layers in CrN/Cr multilayer thin films. The CrN layers of a CrN/Cr multilayer film deposited on a Ti6Al4V substrate by arc ion plating form both a randomly oriented mixed crystal structure and a {112}-oriented structure. Therefore, accurate stress measurement of the CrN layers cannot be performed by applying the sin2ψ x-ray method assuming an isotropic homogeneous material. To overcome this obstacle, the proposed method to measure the residual stress uses four CrN-422 diffractions: at ψ = 0°, 33.56°, 48.19°, and 60.00°. Next, the authors vary the density of Cr droplets on the film surface to evaluate how it affects the residual stress in the CrN/Cr multilayer film. The results indicate that the Cr layer has a residual compressive stress of −350 to −530 MPa and that the two CrN layers have a very large residual compressive stress of −3.5 to −8.2 GPa. In addition, both residual compressive stresses decrease with increasing droplet density.
掲載誌名
Journal of Vacuum Science & Technology B
ISSN
21662746
21662754
cat書誌ID
AA10804928
出版者
American Vacuum Society
37
6
開始ページ
062919
発行日
2019-10-31
備考
This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in Journal of Vacuum Science & Technology B 37, 062919 (2019) and may be found at https://doi.org/10.1116/1.5118682.
This paper is part of the Conference Collection: 15th International Symposium on Sputtering and Plasma Processes (ISSP2019).
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言語
eng
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出版社版
部局
理工学系