ID | 117757 |
Author |
Haraguchi, Masanobu
Tokushima University
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Naoi, Yoshiki
Tokushima University
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Content Type |
Journal Article
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Description | An ultra-thin perfect absorber for deep ultraviolet light was realized using an Al/TiO2/AlN system. The TiO2 thickness was optimized using the Fresnel phasor diagram in complex space to achieve perfect light absorption. As a result of the calculation almost perfect absorption into the TiO2 film was found, despite the film being much thinner than the wavelength. An optimized Al/TiO2/AlN system was fabricated, and an average absorption greater than 97% was experimentally demonstrated at wavelengths of approximately 255–280 nm at normal light incidence. Our structure does not require nanopatterning processes, and this is advantageous for low-cost and large-area manufacturing.
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Journal Title |
Optics Express
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ISSN | 10944087
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Publisher | Optica Publishing Group
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Volume | 30
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Issue | 24
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Start Page | 44229
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End Page | 44239
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Published Date | 2022-11-17
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EDB ID | |
DOI (Published Version) | |
URL ( Publisher's Version ) | |
FullText File | |
language |
eng
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TextVersion |
Publisher
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departments |
Science and Technology
Institute of Post-LED Photonics
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