ID | 117757 |
著者 | |
資料タイプ |
学術雑誌論文
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抄録 | An ultra-thin perfect absorber for deep ultraviolet light was realized using an Al/TiO2/AlN system. The TiO2 thickness was optimized using the Fresnel phasor diagram in complex space to achieve perfect light absorption. As a result of the calculation almost perfect absorption into the TiO2 film was found, despite the film being much thinner than the wavelength. An optimized Al/TiO2/AlN system was fabricated, and an average absorption greater than 97% was experimentally demonstrated at wavelengths of approximately 255–280 nm at normal light incidence. Our structure does not require nanopatterning processes, and this is advantageous for low-cost and large-area manufacturing.
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掲載誌名 |
Optics Express
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ISSN | 10944087
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出版者 | Optica Publishing Group
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巻 | 30
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号 | 24
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開始ページ | 44229
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終了ページ | 44239
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発行日 | 2022-11-17
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EDB ID | |
出版社版DOI | |
出版社版URL | |
フルテキストファイル | |
言語 |
eng
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著者版フラグ |
出版社版
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部局 |
理工学系
ポストLEDフォトニクス研究所
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