ID | 110898 |
著者 |
O, Ryong-Sok
The University of Tokushima
Iwamoto, Atsushi
The University of Tokushima
Nishi, Yuki
The University of Tokushima
Funase, Yuya
The University of Tokushima
Yuasa, Takahiro
The University of Tokushima
日比野, 浩樹
NTT Basic Research Laboratories, Nippon Telegraph and Telephone Corporation
山口, 浩司
NTT Basic Research Laboratories, Nippon Telegraph and Telephone Corporation
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資料タイプ |
学術雑誌論文
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抄録 | We propose a quality control method for wafer-scale epitaxial graphene grown on SiC substrates. The peak position of Raman spectra of epitaxial graphene is an excellent indicator of film quality and reveals irregularities, such as graphene thickness inhomogeneity and SiC substrate defects. A comparison of microscopic Raman maps and scanning probe microscopy images of the same position of the sample revealed that wave numbers of Raman peaks (G and 2D band peaks) were strongly correlated with the strain in the graphene film. The increase in number of graphene layers (2 to 3–4 layers) induced phonon softening (~6 cm-1) and broadening (~6 cm-1) of the 2D band peak. Significant phonon softening and abnormal broadening of the Raman peaks were observed at residual scratches on the SiC substrate. The quantitative layer number distribution of graphene on SiC is successfully estimated from the wave number distribution of the 2D band peak.
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掲載誌名 |
Japanese Journal of Applied Physics
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ISSN | 13474065
00214922
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cat書誌ID | AA11509854
AA12295836
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出版者 | The Japan Society of Applied Physics
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巻 | 51
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号 | 6S
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開始ページ | 06FD06
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並び順 | 06FD06
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発行日 | 2012-06-20
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備考 | © 2012 The Japan Society of Applied Physics
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EDB ID | |
出版社版URL | |
フルテキストファイル | |
言語 |
eng
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著者版フラグ |
著者版
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部局 |
理工学系
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