直近一年間の累計
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ID 110898
著者
O, Ryong-Sok The University of Tokushima
Iwamoto, Atsushi The University of Tokushima
Nishi, Yuki The University of Tokushima
Funase, Yuya The University of Tokushima
Yuasa, Takahiro The University of Tokushima
日比野, 浩樹 NTT Basic Research Laboratories, Nippon Telegraph and Telephone Corporation
山口, 浩司 NTT Basic Research Laboratories, Nippon Telegraph and Telephone Corporation
資料タイプ
学術雑誌論文
抄録
We propose a quality control method for wafer-scale epitaxial graphene grown on SiC substrates. The peak position of Raman spectra of epitaxial graphene is an excellent indicator of film quality and reveals irregularities, such as graphene thickness inhomogeneity and SiC substrate defects. A comparison of microscopic Raman maps and scanning probe microscopy images of the same position of the sample revealed that wave numbers of Raman peaks (G and 2D band peaks) were strongly correlated with the strain in the graphene film. The increase in number of graphene layers (2 to 3–4 layers) induced phonon softening (~6 cm-1) and broadening (~6 cm-1) of the 2D band peak. Significant phonon softening and abnormal broadening of the Raman peaks were observed at residual scratches on the SiC substrate. The quantitative layer number distribution of graphene on SiC is successfully estimated from the wave number distribution of the 2D band peak.
掲載誌名
Japanese Journal of Applied Physics
ISSN
13474065
00214922
cat書誌ID
AA11509854
AA12295836
出版者
The Japan Society of Applied Physics
51
6S
開始ページ
06FD06
並び順
06FD06
発行日
2012-06-20
備考
© 2012 The Japan Society of Applied Physics
EDB ID
出版社版URL
フルテキストファイル
言語
eng
著者版フラグ
著者版
部局
理工学系