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ID 117757
著者
資料タイプ
学術雑誌論文
抄録
An ultra-thin perfect absorber for deep ultraviolet light was realized using an Al/TiO2/AlN system. The TiO2 thickness was optimized using the Fresnel phasor diagram in complex space to achieve perfect light absorption. As a result of the calculation almost perfect absorption into the TiO2 film was found, despite the film being much thinner than the wavelength. An optimized Al/TiO2/AlN system was fabricated, and an average absorption greater than 97% was experimentally demonstrated at wavelengths of approximately 255–280 nm at normal light incidence. Our structure does not require nanopatterning processes, and this is advantageous for low-cost and large-area manufacturing.
掲載誌名
Optics Express
ISSN
10944087
出版者
Optica Publishing Group
30
24
開始ページ
44229
終了ページ
44239
発行日
2022-11-17
EDB ID
出版社版DOI
出版社版URL
フルテキストファイル
言語
eng
著者版フラグ
出版社版
部局
理工学系
ポストLEDフォトニクス研究所