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ID 114029
タイトル別表記
Measurement of the residual stress in CrN coatings deposited on an Al alloy substrate
著者
Shirasaka, Kenta Tokushima University
Tanaka, Yuta IHI Corporation
資料タイプ
学術雑誌論文
抄録
Chromium nitride (CrN) coatings were deposited on Al alloy substrates using the arc ion plating method with different bias voltages and different thicknesses. The residual stresses of these samples were measured via x-ray diffraction using the sin2 ψ method because the CrN crystals in the coatings were nonoriented. The stress gradient across the CrN coating was calculated from the curved 2θ-sin2 ψ diagram. In the case of CrN coatings deposited at low bias voltage, the compressive residual stress that formed at the substrate interface was larger than the stress at the surface of the CrN coating. Conversely, in the case of CrN coatings deposited at high bias voltage, the compressive residual stress on the surface of the CrN coating was larger than the stress on the interface with the substrate. In CrN coatings deposited at high bias voltage, very large compressive residual stress on the CrN coating surface decreased with increasing coating thickness.
掲載誌名
Journal of Vacuum Science & Technology B
ISSN
21662746
21662754
cat書誌ID
AA10804928
出版者
American Vacuum Society
37
6
開始ページ
062916
発行日
2019-10-28
備考
This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in Journal of Vacuum Science & Technology B 37, 062916 (2019) and may be found at https://doi.org/10.1116/1.5118702.
This paper is part of the Conference Collection: 15th International Symposium on Sputtering and Plasma Processes (ISSP2019).
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フルテキストファイル
言語
eng
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出版社版
部局
理工学系